Cleanroom
SUSS LabSpin6 Spin Coater
The SUSS LabSpin6 supports spin coating for lithography and thin-film preparation.
Details
This tool is used to coat substrates with photoresist, polymers, or other approved liquid materials with controlled speed and timing.
Typical uses
- Apply photoresist for lithography
- Coat polymers or thin liquid films
- Support repeatable substrate preparation
Access notes
Approved materials, recipes, and cleanup steps are required before use.
Cleanroom tools may require intake, orientation, training, approved process details, and booking through NEMO before use.