SUSS LabSpin6 Spin Coater
The SUSS LabSpin6 supports spin coating for lithography and thin-film preparation.
Details
This tool is used to coat substrates with photoresist, polymers, or other approved liquid materials with controlled speed and timing.
Typical uses
- Apply photoresist for lithography
- Coat polymers or thin liquid films
- Support repeatable substrate preparation
Access notes
Approved materials, recipes, and cleanup steps are required before use.