Cleanroom

OAI Mask Aligner 200IR

The OAI Mask Aligner 200IR supports photolithography exposure and alignment workflows.

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OAI Mask Aligner 200IR
OAI Mask Aligner 200IR Mask aligner for photolithography exposure and aligned pattern transfer.

Details

Use this tool for mask-based lithography, multilayer alignment, and pattern transfer onto compatible substrates.

Typical uses

  • Expose photoresist patterns
  • Align multilayer features
  • Support cleanroom microfabrication

Access notes

Lithography training, approved masks, and process details are required before independent use.

Cleanroom tools may require intake, orientation, training, approved process details, and booking through NEMO before use.