OAI Mask Aligner 200IR
The OAI Mask Aligner 200IR supports photolithography exposure and alignment workflows.
Details
Use this tool for mask-based lithography, multilayer alignment, and pattern transfer onto compatible substrates.
Typical uses
- Expose photoresist patterns
- Align multilayer features
- Support cleanroom microfabrication
Access notes
Lithography training, approved masks, and process details are required before independent use.