Cleanroom

Heidelberg Mask Writer

The Heidelberg mask writer supports high-resolution pattern generation for microfabrication workflows.

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Heidelberg mask writer
Heidelberg Mask Writer Direct-write lithography system for patterning masks and microscale device features.

Details

This system is used to create mask patterns or directly write microscale structures for masters, devices, and process development.

Typical uses

  • Write photomasks and microscale patterns
  • Support lithography process development
  • Create masters for microdevice fabrication

Access notes

Pattern files, substrate preparation, and process requirements should be reviewed with staff before use.

Cleanroom tools may require intake, orientation, training, approved process details, and booking through NEMO before use.