Cleanroom

Developer Bench

The Developer Bench supports development steps for approved lithography processes in the cleanroom.

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Developer wet bench
Developer Bench Cleanroom wet bench for approved lithography development workflows.

Details

Use this bench for compatible developer chemistry and rinse workflows associated with photoresist patterning and cleanroom fabrication.

Typical uses

  • Develop patterned photoresist
  • Support lithography process workflows
  • Handle approved wet processing steps

Access notes

Cleanroom access, chemical safety training, approved recipes, and staff guidance may be required before use.

Cleanroom tools may require intake, orientation, training, approved process details, and booking through NEMO before use.